Effect of sputtering target power on microstructure and mechanical properties of nanocomposite nc-TiNya-SiN thin films

Nanocrystalline TiN has been imbedded in amorphous silicon nitride matrix to form a super hard nanocomposite thin film (ncTiNya-SiN ) via magnetron sputtering. Adjusting Ti and Si N target power ratio altered film composition, size, amount and x 3 4 distribution of the nc-TiN phase. At a Ti target power density of 5.5 W cm , the Ti to Si N target power ratio should be greater y2 3 4 than unity in order for nc-TiN to form, otherwise, Ti will dissolve in amorphous SiN . The relationship between the film hardness x and the crystallite size show Hall–Petch and anti-Hall–Petch relationship. A ‘scratch crack propagation resistance’ parameter, or CPR sL (L yL ), has been proposed to approximate thin film toughness from the critical load data easily obtained from a s c1 c2 c1 scratch adhesion test. 2003 Elsevier B.V. All rights reserved.